International Journal For Multidisciplinary Research

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Advancements in Semiconductor Packaging: Exploring the Potential of 3D Multi-Die Stacking Technology

Author(s) Monish Katari, Muthukrishnan Muthusubramanian, Anish Tadimarri, Jesu Narkarunai Arasu Malaiyappan
Country United States
Abstract The rapid evolution of semiconductor packaging technologies has led to the emergence of 3D multi-die stacking as a promising approach for achieving higher levels of integration and performance in electronic devices. This research paper comprehensively examines the advancements, applications, challenges, economic implications, regulatory considerations, and future prospects of 3D stacking technology. Through an in-depth analysis of current research, industry trends, and market dynamics, the paper elucidates the technical, economic, and regulatory aspects shaping the adoption and development of 3D stacking. Key findings highlight the potential benefits of 3D stacking in enhancing device functionality, optimizing manufacturing processes, and addressing environmental sustainability. The paper also identifies critical challenges such as thermal management, signal integrity, and regulatory compliance that semiconductor manufacturers must overcome to realize the full potential of 3D stacking. Furthermore, the paper outlines future directions, including integration with emerging technologies, advancements in materials and processes, and sustainability initiatives, to drive continued innovation in semiconductor packaging.
Keywords Semiconductor packaging, 3D multi-die stacking, Advancements, Applications, Challenges, Economic implications, Regulatory considerations, Future prospects
Field Engineering
Published In Volume 5, Issue 5, September-October 2023
Published On 2023-09-05
Cite This Advancements in Semiconductor Packaging: Exploring the Potential of 3D Multi-Die Stacking Technology - Monish Katari, Muthukrishnan Muthusubramanian, Anish Tadimarri, Jesu Narkarunai Arasu Malaiyappan - IJFMR Volume 5, Issue 5, September-October 2023. DOI 10.36948/ijfmr.2023.v05i05.16945
DOI https://doi.org/10.36948/ijfmr.2023.v05i05.16945
Short DOI https://doi.org/gtq3bv
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